Maskless lithography UV Direct Laser Writer
Laser lithography systems for all requirements
Raith offers laser lithography systems ranging from tabletop systems for up to 4” substrates to standalone systems that cover any sample from 5 mm to 8” and beyond. Raith’s laser lithography systems are user-friendly maskless lithography tools that deliver excellent performance in producing microstructures with the highest resolution available in the market.
When ultimate resolution matters
Laser beam lithography on your table
MICROMASTER is an entry-level maskless laser writer for laser beam lithography. Its table-top compact design requires minimum cleanroom space, but still delivers uncompromisingingly high-quality resolution below 1 µm and full grayscale capability up to 4096 levels.
Features include:
- Competitive 0.8 µm resolution
- Optional writing modes with 1.5 µm, 2.5 µm and 5 µm resolution
- Long-life 405 nm diode laser
- 375 nm source optionally available for i-Line resists
- Automatic switching between writing modes
- <0.5 µm 2nd-layer alignment accuracy
MICROMASTER enables the creation of various 2D and 2.5D microstructures in photosensitive resists right after installation. Laser beam lithography becomes accessible to everyone with the entry-level MICROMASTER tool, which is already successfully used by different research groups around the world for a broad variety of applications in research, semiconductors, photonics, mask making, 3D lithography, diffractive optical elements, microfluidics, and many more.
When ultimate resolution matters
The direct laser writers with ultimate resolution
PICOMASTER is a series of direct laser writers that work with a single laser beam to create high-resolution structures. The versatile, low-maintenance laser writer provides best-in-class resolution for features and grating periodicity. The user-friendly PICOMASTER series provides the perfect solution for your laser lithography challenges.
With features such as:
- Single focused beam writing strategy
- Down to 0.3 μm resolution
- 4096-level grayscale lithography
- Proprietary autofocus even on challenging substrates
- Up to 8” x 8” exposable area
- Stitch-free exposure
PICOMASTER direct laser writers offer the perfect solution for your microfabrication needs.
With 405 and 375 laser sources available, a resolution of 300 nm is guaranteed, so that PICOMASTER direct laser writers produce the highest resolution available in the market. Enhancing innovation strength for scientific and industrial purposes, these maskless direct laser writers unlock unique opportunities for R&D in photonic devices, microelectronics, MEMS, 3D lithography, optical variable devices (OVD), diffractive optical elements, and many more.
PICOMASTER is a PROPER tool for your lab:
PRECISION: Offering high-precision laser power control even for fine doses, autofocus even on challenging samples, and alignment accuracy
RESOLUTION: Enabling best-in-class resolution for both features and gratings, with periodicity down to sub-300 nm features
OPTIMIZATION: Can be optimized to any type of application with tabletop or standalone system selection, appropriate laser source wavelengths, and choice of writing modes
PROFILING: Providing ultimate grayscale capability up to 4096 levels without affecting exposure speed for best-in-class 2.5D resist profiling
EASE of USE: Easy sample handling supported by inhouse-designed aligning tools and a powerful user interface for convenience in working with most common file formats
REDUCED MAINTENANCE COST: Smooth, quick, and cost-efficient maintenance with maintenance-free motion platform and long-life optical module (10,000 hours), which is easy to replace with no need for a service visit
The maskless lithography system with ultimate speed
PICOMASTER XF is an eXtra Fast maskless lithography system that pushes the throughput of your microfabrication to the next level. With new multi-beam technology, PIOCMASTER XF operates at a writing speed of 280 mm²/min with an ultimate 600 nm resolution.
With features such as:
- Parallel multi beam writing strategy
- Down to 0.6 μm resolution
- Write speed up to 280 mm²/min at 0.6 μm resolution
- 256 levels of real-time grayscale lithography
- Proprietary autofocus even on challenging substrates
- Up to 8” x 8” exposable area
- Stitch-free exposure
PICOMASTER XF offers maximum throughput at high precision. With its high accuracy and speed, the PICOMASTER XF maskless lithography system is suitable for research labs and universities as well as for production nodes for semiconductors, electronics, photonics, mask-making, 3D lithography, diffractive optical elements, microfluidics, RF devices, LED, flat panels, and AR/VR devices.
PICOMASTER XF is a FASTER tool for your lab:
FLEXIBILITY: Can be flexibly configured to meet the requirements of even the most challenging applications by adding autoloading system, large-scale substrate writing capabilities (up to meters), full-process integrated workbench
ACCURACY: Offering high-accuracy laser power control to ensure precise doses, autofocus accuracy even on challenging samples and close to sample edges, and alignment accuracy down to 0.25 µm
SPEED: Offering multibeam exposure technology, the maskless lithography system PICOMASTER XF is over 100 times faster than single beam machines, achieving exposure of a full 6” wafer in 1 hour
THROUGHPUT: The PICOMASTER XF’s multibeam exposure technology, fast and precise stage mechanics, and software buffering system ensure stable high throughput
EASE of USE: Easy sample handling supported by inhouse-designed aligning tools and a powerful user interface for convenience in working with most common file formats
REDUCED MAINTENANCE COST: Smooth, quick, and cost-efficient maintenance with maintenance-free motion platform and long-lifetime optical module (10,000 hours), which is easy to replace with no need for a service visit