Polos Logo Spincoating.com: everything you need to know about spin coaters!

SPIN PROCESSING WITH THE POLOS SPIN COATER?

A spin coater is mostly used for creating thin films with thicknesses below 10 nm of even high quality thickness, using centripetal force. Typically you spinphotoresist on a spin coater, but the POLOS spin processor is also used for spin coating polymer thin films like blockcopolymers (BCP) as PDMS and PMMA, or as a low-cost sol–gel solution for spin-coated ZnO films.

WHEN IT COMES TO SPIN PROCESS APPLICATIONS

All POLOS spin coaters are suitable to most typical spin process applications such as cleaning, rinse/dry, and coating. From low priced, inexpensive laboratory spin coaters SPIN150i or SPIN200i to POLOS Advanced single wafer spin coating equipment with multiple dispense lines, suitable for developingand etching. With over 2,000 coaters in the field, our bench top spin coaters and in-deck spin processor designs have proven themselves over the years for processing a wide range of substrates from small fragments up to diameter 450mm substrates or LCD or glass panels up to 900mm.

INFINITE SPIN PROCESSES

Each Fab, each R&D or even each student in university employs different spin processes. POLOS spin coater equipment offer unlimited processes: intuitive programming on the touch screen controller, even USB up- or download from your own pc, if so preferred, with unlimited programs /steps and graphical representation. This makes the POLOS SPIN150i the best laboratory spin coater you can buy!

EASY ACCESS AND CLEAR VIEW OF YOUR SPIN COATING PROCESS?

See your process through the clear tempered glass spin coater lid. The lid hinge holds at optimum angle for Easy Access and for your safety lockselectromagnetically until the end of the spin coating process. The Vee-Lid ensures residual chemicals on the lid run safely to the system drain. A labyrinth seal protects the motor and control electronics from chemical contamination. The detachable keyboard with LAN cable makes it very suitable for use in a glove box.

UNIFORMITY OF SPIN COATING?

The Syringe Holder & Diffuser for N2 purge reduce air turbulence in the chamber. The digital motor speed controller enables accurate acceleration andstable rotations, both critical factors for coating uniformity.

THE RIGHT SPIN COATER MATERIALS FOR YOUR SPIN PROCESS?

For our spin coaters and chucks we use fine and stable alpha crystalline structure NPP (natural polypropylene). Where the application requires PTFE, we useTFM1600 material, superior for use with chemicals above standard PTFE. Check the chemical compatibility in our Spin Coater Base Material check list.

spin150i

SPIN150I

The SPIN150i is a Affordable Spin Coater and is suitable for processing fragments of 5mm up to Ø150mm/6 inch wafers (or Ø160mm substrates), or 4″x4″ square substrates.

Available in Tabletop of In-Deck models for integration into your wetbench.
The POLOS SPIN-series standard comes with 3 I/O ports, to hook up with for example a foot-pedal for hands-free operation or dispense units. (Suitable for use in Glovebox.)

spin200i

SPIN200I

polos200 advanced

POLOS200

Both spin coaters the POLOS SPIN200i and POLOS Advanced 200 are suitable for processing fragments of  Ø200mm/8 inch wafers (or Ø260mm substrates), or 6″x6″ square substrates.

Both models are available in Table top of In Deck models for integration into your wetbench.

The POLOS SPIN series standard comes with 3 I/O ports, to hook up with for example a foot-pedal for hands-free operation or dispense units.

The POLOS Advanced can be completely customized to customer demands, including domed lid and multiple chemical dispense lines. The Polos Advanced series allow the user to either dispense manually through the syringe or by using the optional manifold, with selectable valve(s) for dispensing chemical from the Dispense Vessel (DV), DI Water or N2.

polos300 advanced

POLOS300

The POLOS Advanced 300 spin coater is suitable for processing fragments of  Ø300mm/12 inch wafers (or Ø360mm substrates), or 8″x8″ square substrates. The unit is also available as an in-deck version for integration into your wetbench. The POLOS Advanced series spin processors are very versatile spincoaters for a wide range of processes, including developing or etching.  The units are completely custom-build to meet customer requirements. Domed lid and multiple chemical dispense lines are optionally available.
polos450 polos600sst polos1000sst process station
POLOS450 POLOS600 POLOS1000 Process Station

SPIN150I TANITIM VİDEOSU


a-type Round Substrates
2″ up to 300mm wafers
Multi-purpose Vacuum Chuck, without centering pins.

A – Type

A-V36-S45-PP-HD, Vacuum Chuck Ø45mm (1,75″), up to 6″

A-V87-S96-PP-HD, Vacuum Chuck Ø96mm (3,75″), 8″

B & L-type Round Substrates
2″ up to 300mm wafers
Vacuum Chuck, with centering pins, for high speed application

B & L – Type

C & E - Type Round Substrates
2″ up to 300mm wafers
Non-Vacuum Chuck, with centering pins. For edge contact only.

C & E – Type

D-Type Fragments/Die

Vacuum Chuck Adapter,
for small substrate/fragment

D – Type

D-V10-S50-PP, Fragment Adaptor, Vacuum 50mm centerhole for use with A-V36-S45-PP Vacuum Chuck

D-V2.5-S50-PP, Fragment Adaptor, Vacuum 50mm centerhole for use with A-V36-S45-PP Vacuum Chuck

K-Type Rectangular Substrates
(Laboratory Glass, etc.)
With embedded recess for precise coating. Vacuum Chuck.

K – Type

H-Type Low contact.
Non-vacuum Chuck with clearance for round and square/ rectangular substrate, and centering pins. For back side processing.

H – Type

J-Type Thin, Fragile Substrates.
Vacuum Chuck
Also porous PTFE chucks are available.

J – Type

Vacuum Chuck for film or other thin substrates.

**Spesifik uygulamalar için chuck üretimi mümlündür (N-Type Chuck).

**Ayrıca tüm chuck lar için farklı boyutlarda üretim mümkündür. 

Chuck ları daha detaylı inceleyebilmek için tıklayınız.


spin drying

SPIN DRYING

rinse-cleaning

RINSE / CLEANING

spin etching

SPIN ETCHING

manual coating

MANUAL COATING

automatic coating

AUTOMATIC COATING

spin developing

SPIN DEVELOPING

chemical compatibilty

CHEMICAL COMPATIB.

spin coating theorh

SPIN COATING HEORY

Spin coater uygulamalarını daha detaylı

inceleyebilmek için tıklayınız.


Spin coater sistemlerimiz ile ilgili daha detaylı bilgi almak için tıklayınız.